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Range from Focus
ZebraOptical Optoprofiler
Sunrise Optical LLC (http://zebraoptical.com) has developed an optical is immune
to mechanical vibrations and stray light.
to mechanical vibrations and stray light.
tool for precise topography measurement of rough
or feature rich samples.
precision piezo stage. The defocused images are
then analyzed using a proprietary algorithm to
recover the topography and roughness of the
sample.
The unit is sold as an attachment to the standard
ZebraOptical Microscope system.
Technology is similar to that presented in the Small
Splatter metrology tool in our standard brochure.
Limitations:
or feature rich samples.
precision piezo stage. The defocused images are
then analyzed using a proprietary algorithm to
recover the topography and roughness of the
sample.
The unit is sold as an attachment to the standard
ZebraOptical Microscope system.
Technology is similar to that presented in the Small
Splatter metrology tool in our standard brochure.
Limitations:
 | This system is limited to samples which | |
| have feature rich surfaces, for which the system can measure and analyze defocused | ||
| System is not suitable for the | |
| measurement of smooth surfaces. |
Field of view: ~100 um x 80 um
Depth of field: 0.18 um
Z resolution 0.1 um
Piezo Resolution: 0.03 um
The system is comprised of the Standard
ZebraOptical Microscopy system, the range
from defocus attachment, a control box
(similar to that pictured above), and a PC
including the image processing software.
Recovered sample topography using small
sample metrology system. The accuracy and
reproducibility depends on type of objective
used.
Principle of Operation:
A precision stage varies the z-position of the sample
to produce both focused and blurred images.
coordinate from defocus tool can be used to
calculate various surface parameters, including:
Contact info@zebraoptical.com to learn moreabout this option.
calculate various surface parameters, including:
| Flatness | |
| Curvature | |
| Roughness Parameters | |
| Ra (arithmetic average) | |
| RMS (root mean squared) | |
| Rv (maximum valley depth) | |
| Rp (maximum peak height) | |
| Rt (maximum profile height) | |
| Rsk (skew) | |
| Rku (kurtosis) |
Contact info@zebraoptical.com to learn more
change.
Wafer sizes 100, 150, or 200 mm
Radii of curvature measurements (10 m - 1500 m*)
Repeatability 1.0% (1 sigma) of average value of
radius of curvature*)
Results Report Film Radius, Wafer Bow Height,
Warp, Substrate Thickness, Film Thickness, Date
and Time
*) Repeatability specified for 750 um blanket wafer. For
other wafers it may vary.
Wafer sizes 100, 150, or 200 mm
Radii of curvature measurements (10 m - 1500 m*)
Repeatability 1.0% (1 sigma) of average value of
radius of curvature*)
Results Report Film Radius, Wafer Bow Height,
Warp, Substrate Thickness, Film Thickness, Date
and Time
*) Repeatability specified for 750 um blanket wafer. For
other wafers it may vary.
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Important note: All product specifications are subject to change without notice. For up to date
product specifications please contact headquarters directly.
product specifications please contact headquarters directly.
Bottom: Sample images brought
into and out of focus
into and out of focus
System was used to analyze the
topography of the reverse side of a
topography of the reverse side of a